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Selective fluorescence functionalization of dye-doped polymerized structures fabricated by direct laser writing (DLW) lithography

机译:通过直接激光写入(DLW)光刻技术制备的染料掺杂聚合结构的选择性荧光功能化

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摘要

The continuous development of the vast arsenal of fabrication techniques is a pivotal factor in the breakthrough of nanotechnology. Although the broad interest is generally focused on the reduction of the dimensions of the fabricated structures, localized functionalization of the nanomaterials emerges as a key factor closely linked to their potential applications. In particular, fabrication of spatially selective fluorescence nanostructures is highly demanded in nanophotonics, as for example in three-dimensional (3D) optical data storage (ODS), where massive storage capacity and fast writing–reading processes are promised. We have developed an innovative method to control the location and intensity of the fluorescence signal in dye-doped photopolymerized structures fabricated with Direct Laser Writing (DLW) lithography. Well-defined fluorescent pixels (area = 0.24 μm2) were written inside a polymer matrix with the help of a femtosecond pulsed laser (multiphoton absorption) via a thermally-induced di-aggregation of a fluorescent dye. Moreover, we have accomplished a fine control of the fluorescence intensity which can increase the storage capacity of ODS systems fabricated with this approach.
机译:庞大的制造技术库的不断发展是纳米技术突破的关键因素。尽管广泛的兴趣通常集中在减小制造结构的尺寸上,但是纳米材料的局部功能化作为与其潜在应用密切相关的关键因素而出现。特别地,在纳米光子学中,例如在三维(3D)光学数据存储(ODS)中,对空间选择性荧光纳米结构的制造提出了很高的要求,在这种情况下,有望实现大规模存储容量和快速的读写过程。我们已经开发出一种创新的方法来控制用直接激光写入(DLW)光刻技术制造的染料掺杂光聚合结构中荧光信号的位置和强度。在飞秒脉冲激光(多光子吸收)的帮助下,通过热诱导的荧光染料的二次聚集,将定义明确的荧光像素(面积= 0.24μm2)写入聚合物基质中。此外,我们已经完成了对荧光强度的精细控制,可以提高用这种方法制造的ODS系统的存储容量。

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